GOALI: Mist-Deposition Based Manufacturing of Matrix Displays from Solution-Processed Semiconductor Quantum Dots

GOALI:通过溶液处理的半导体量子点基于雾沉积制造矩阵显示器

基本信息

  • 批准号:
    0729263
  • 负责人:
  • 金额:
    --
  • 依托单位:
  • 依托单位国家:
    美国
  • 项目类别:
    Standard Grant
  • 财政年份:
    2007
  • 资助国家:
    美国
  • 起止时间:
    2007-09-01 至 2011-02-28
  • 项目状态:
    已结题

项目摘要

This project aims to explore the use of mist-deposition process as a new nanomanufacturing technology for the efficient deposition and patterning of ultrathin films of semiconductor nanocrystal quantum dots (NQDs) in the context of developing high-performance quantum dot light emitting diodes (QD-LEDs) and QD-LED matrix displays. The process variables that control the thickness, composition, surface morphology and uniformity of the emissive NQD film will be investigated in order to establish a NQD-deposition protocol through an understanding of the formation, charging, transport, and coalescence process of the nanoscale droplets in mist-deposition process. The processing of QD-LED devices will be optimized by tailoring the thickness and morphology of NQD-active layers with the mist-deposition process. The LED performance will be characterized and correlated to the process parameters in order to study the ultimate limits of the mist-deposition technology in QD-LED processing. The employment of sequential shadow-mask patterning in the mist-deposition process will be investigated to create RGB-pixel arrays of bright QD-LEDs over large surface areas. The target of this project will be the development of a versatile, efficient, and scalable technique for manufacturing of a full-color, passive matrix QD-LED display.This research project will address two fundamental, interrelated issues related to QD-LEDs technology: fabrication method and devices. The synergistic approach employed in this study will significantly expand the understanding of nanocrystalline quantum dots processing and device mechanism. The broader impacts of the proposed project go beyond the realm of a purely technical endeavor and are related to the anticipated future role of nanocrystalline quantum dots based devices in everyday life. For instance, technical breakthrough such as flexible displays will have a profound impact on the way we transmit and receive information. A range of new applications that will be made possible due to the improved processing of nanocrystalline semiconductors will create new sizeable markets, and hence, may have a noticeable impact of nation's economy. The proposed study will also provide focused research and learning experience to undergraduate students by involvement in experimental laboratory work, and help them to bridge the fundamental nanoscience with the real-world applications of nanotechnology.
该项目旨在探索将雾沉积过程用作一种新的纳米制造技术,以在开发高性能量子量子点发光diodes(qd-leds)和qd-dled matrix显示器的情况下,在开发高性能量子量子点光(QD-diodes)的情况下有效地沉积和模式。将研究发射NQD膜的厚度,组成,表面形态和均匀性的过程变量,以通过了解雾中沉积过程中纳米级滴剂的形成,充电,运输和合并过程来建立NQD沉积方案。通过雾沉积过程来调整NQD活性层的厚度和形态,可以优化QD领导的设备的处理。 LED性能将与过程参数进行特征并相关,以便研究QD主导处理中雾沉积技术的最终限制。将研究在薄雾沉积过程中使用顺序的阴影掩盖图案,以在大型表面积上创建明亮QD-LED的RGB像素阵列。该项目的目标是开发一种多功能,高效且可扩展的技术,用于制造全面的,被动的矩阵QD QD主角。该研究项目将解决与QD-LED技术相关的两个基本,相互关联的问题:制造方法和设备。这项研究中采用的协同方法将显着扩大对纳米晶量点处理和设备机制的理解。拟议项目的更广泛的影响超出了纯粹技术努力的领域,并且与基于纳米晶量子点的设备在日常生活中的预期作用有关。例如,诸如灵活展示之类的技术突破将对我们传输和接收信息的方式产生深远的影响。由于纳米晶半导体的加工改善将创造出一系列新的应用程序,这将创造出新的较大的市场,因此可能会对国家的经济产生明显的影响。 拟议的研究还将通过参与实验实验室工作来为本科生提供重点的研究和学习经验,并帮助他们使用纳米技术的现实应用来桥接基本的纳米科学。

项目成果

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Jian Xu其他文献

Influences of rosuvastatin on the expression of matrix metallopeptidase 9 (MMP-9) through extracellular- signal-regulated kinases (ERK) pathway in mononuclear cell line (THP-1) derived macrophages induced by oxidized low density lipoprotein
瑞舒伐他汀通过细胞外信号调节激酶 (ERK) 途径对氧化低密度脂蛋白诱导的单核细胞系 (THP-1) 巨噬细胞中基质金属肽酶 9 (MMP-9) 表达的影响
  • DOI:
  • 发表时间:
    2013
  • 期刊:
  • 影响因子:
    0
  • 作者:
    Qian Zhang;Hong;Ji Yan;Li;Jian Xu;Hua Yu;Kangyu Chen
  • 通讯作者:
    Kangyu Chen
The impact of academic buoyancy and emotions on university students’ self-regulated learning strategies in L2 writing classrooms
学业积极性和情绪对大学生二语写作课堂自我调节学习策略的影响
  • DOI:
    10.1007/s11145-023-10411-9
  • 发表时间:
    2023
  • 期刊:
  • 影响因子:
    2.5
  • 作者:
    Jian Xu;Yabing Wang
  • 通讯作者:
    Yabing Wang
Assessing contributions of natural surface and anthropogenic emissions to atmospheric mercury in a fast-developing region of eastern China from 2015 to 2018
评估2015年至2018年中国东部快速发展地区自然地表和人为排放对大气汞的贡献
  • DOI:
    10.5194/acp-20-10985-2020
  • 发表时间:
    2020-09
  • 期刊:
  • 影响因子:
    0
  • 作者:
    Xiaofei Qin;Leiming Zhang;Guochen Wang;Xiaohao Wang;Qingyan Fu;Jian Xu;Hao Li;Jia Chen;Qianbiao Zhao;Yanfen Lin;Juntao Huo;Fengwen Wang;Kan Huang;Congrui Deng
  • 通讯作者:
    Congrui Deng
Researches on Image Distortion Correction Method Based on Image Magnification
基于图像放大倍数的图像畸变校正方法研究
  • DOI:
    10.4028/www.scientific.net/amr.650.548
  • 发表时间:
    2013
  • 期刊:
  • 影响因子:
    0
  • 作者:
    X. Jiang;Jian Xu;Xiaomin Fang;Xin Zhang;Yin Peng;Kunli Fang
  • 通讯作者:
    Kunli Fang
Cascade control of underactuated manipulator based on reinforcement learning framework
基于强化学习框架的欠驱动机械臂级联控制

Jian Xu的其他文献

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{{ truncateString('Jian Xu', 18)}}的其他基金

CAREER: Image critical dental diseases that current dental X-ray/CT fails to detect, without ionizing radiation
职业:在没有电离辐射的情况下对当前牙科 X 射线/CT 无法检测到的严重牙科疾病进行成像
  • 批准号:
    2046929
  • 财政年份:
    2021
  • 资助金额:
    --
  • 项目类别:
    Continuing Grant
CAREER: Two-Photon Pumped Lasing Using Semiconductor Nanostructures by Design
职业:设计使用半导体纳米结构的双光子泵浦激光
  • 批准号:
    0846818
  • 财政年份:
    2009
  • 资助金额:
    --
  • 项目类别:
    Standard Grant
First International Symposium on Semiconductor and Plasmonics-Active Nanostructures for Photonic Devices and Systems (Electronics and Photonics); Vienna, Austria; October 4-9, 2009
第一届光子器件和系统(电子学和光子学)半导体和等离子体活性纳米结构国际研讨会;
  • 批准号:
    0939548
  • 财政年份:
    2009
  • 资助金额:
    --
  • 项目类别:
    Standard Grant
GOALI: Enhanced Nonradiative Energy Coupling between Quantum Dot Phosphors and InGaN Emitters - Towards High-Efficiency White LEDs
目标:增强量子点荧光粉和 InGaN 发射器之间的非辐射能量耦合 - 迈向高效白光 LED
  • 批准号:
    0824186
  • 财政年份:
    2008
  • 资助金额:
    --
  • 项目类别:
    Standard Grant

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基于低秩矩阵最优解的多幅多光谱图像薄雾分离方法研究
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Gate insulator deposition process for GaN-based MOS devices using mist-CVD technique
使用雾气 CVD 技术的 GaN 基 MOS 器件的栅极绝缘体沉积工艺
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  • 批准号:
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