Elementary Reactions of Hyperthermal Gas-Phase Oxygen Atoms with Atomic Adsorbates on Si(100)-(2x1): Mechanisms and Kinetics

高温气相氧原子与 Si(100)-(2x1) 上原子吸附物的基本反应：机理和动力学

• 批准号: 0207291
• 负责人: Jason Weaver
• 金额: $ 20.26万
• 依托单位: University of Florida
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2002
• 资助国家: 美国
• 起止时间: 2002-07-15 至 2006-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0207291&HistoricalAwards=false
• 关键词: Elementary; Reactions; Hyperthermal; Gas; Phase

The objective of this proposal is to determine the elementary mechanisms and kinetics governing the non-thermal reactions of hyperthermal, gas-phase oxygen atoms with atoms adsorbed on single crystal silicon. A novel beam source of hyperthermal atomic oxygen will be used to stimulate reactions at the adsorbate-modified silicon surface. The desorbing reaction products will be monitored during the atom-adsorbate reactions using mass spectrometry. The reaction products that remain adsorbed on the surface and the chemical changes of the surface will be studied using thermal desorption, x-ray photoelectron and Auger electron spectroscopy. The reactions of hyperthermal, gas-phase oxygen atoms with adsorbed oxygen, nitrogen, carbon, and deuterium atoms will be investigated with these techniques to determine the influence of adlayer structure and bonding energetics on the elementary mechanisms, kinetics, and selectivity of the reactions. Results of this project will advance the current understanding of elementary atom-adsorbate reactions. The educational component is the mentoring of graduate and undergraduate students. Graduate students will be trained in an area that will be of significant interest to industries interested in heterogeneous chemistry, especially in the semiconductor industry. The results of this work could have a significant impact on our understanding of processes in the semiconductor industry, including plasma processing.

该提案的目的是确定控制超高温气相氧原子与吸附在单晶硅上的原子的非热反应的基本机制和动力学。 一种新型的高温原子氧束源将用于刺激吸附物改性硅表面的反应。 在原子吸附反应期间，将使用质谱法监测解吸反应产物。 将使用热解吸、X射线光电子和俄歇电子能谱来研究仍然吸附在表面上的反应产物以及表面的化学变化。 将利用这些技术研究高温气相氧原子与吸附的氧、氮、碳和氘原子的反应，以确定吸附层结构和键合能量对反应的基本机制、动力学和选择性的影响。 该项目的结果将增进目前对基本原子吸附反应的理解。 教育部分是对研究生和本科生的指导。 研究生将在对异质化学感兴趣的行业（尤其是半导体行业）非常感兴趣的领域接受培训。这项工作的结果可能会对我们对半导体行业工艺（包括等离子体处理）的理解产生重大影响。