Nucleation and Growth of Heteroepitaxial Diamond Thin Films on Ni Substrates

镍基体上异质外延金刚石薄膜的成核与生长

• 批准号: 9615706
• 负责人: Zlatko Sitar
• 金额: $ 37.98万
• 依托单位: North Carolina State University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1997
• 资助国家: 美国
• 起止时间: 1997-04-15 至 2000-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9615706&HistoricalAwards=false
• 关键词: Nucleation; Growth; Heteroepitaxial; Diamond; Thin

9615706 Sitar The proposed project will study heteroepitaxial nucleation and growth of diamond films on nickel (Ni) metal substrates via hot filament chemical vapor deposition. The goal of this research is to produce high quality, single crystal diamond films up to an area of l x l square centimeter on Ni substrates by using a novel chemical vapor deposition (CVD) process involving seeding, annealing, solution treatment, nucleation, and deposition. This multi-step CVD technique has recently been demonstrated to be very effective in suppressing graphite formation and promoting oriented diamond nucleation and growth on Ni substrates. The issues which will be investigated in this proposal include: solubility of carbon in presence of atomic hydrogen, effect of atomic hydrogen on the eutectic temperature; developing effective seeding techniques; optimizing the multi-step deposition process; promoting desired growth orientations; and performing detailed in-vacuo surface characterization and modeling of the nucleation and growth process. %%% The proposed research integrates state-of-the-art equipment and experienced personnel to conduct forefront research in the field of diamond science and technology. It will develop and expand our current knowledge base of diamond growth and enhance the ability to transfer a technological development out of the laboratory stage into useful industrial applications. The successful implementation of this program will greatly advance this vital diamond technology and help the U. S. enjoy continuing global leadership in this important research area. ***

9615706 Sitar 拟议项目将通过热丝化学气相沉积研究镍 (Ni) 金属基底上金刚石薄膜的异质外延成核和生长。 本研究的目标是通过使用新型化学气相沉积 (CVD) 工艺（包括晶种、退火、固溶处理、成核和沉积）在 Ni 基底上生产面积达 1 x 1 平方厘米的高质量单晶金刚石薄膜。这种多步骤 CVD 技术最近被证明在抑制石墨形成和促进镍基体上定向金刚石成核和生长方面非常有效。该提案将研究的问题包括：碳在原子氢存在下的溶解度、原子氢对共晶温度的影响；开发有效的播种技术；优化多步沉积工艺； 促进理想的增长方向；并对成核和生长过程进行详细的真空表面表征和建模。 %%% 拟议的研究整合了最先进的设备和经验丰富的人员，在金刚石科学技术领域进行前沿研究。它将发展和扩展我们现有的钻石生长知识库，并增强将技术开发从实验室阶段转移到有用的工业应用的能力。该计划的成功实施将极大地推进这一重要的钻石技术，并帮助美国在这一重要研究领域继续保持全球领先地位。 ***