Development of a Laboratory for Ultra High Resolution Electron Beam Nanofabrication and Imaging Research in Electrical Engineering and Physics

电气工程和物理领域超高分辨率电子束纳米加工和成像研究实验室的发展

• 批准号: 9601738
• 负责人: Axel Scherer
• 金额: $ 20万
• 依托单位: California Institute of Technology
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1996
• 资助国家: 美国
• 起止时间: 1996-09-01 至 1998-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9601738&HistoricalAwards=false
• 关键词: Development; Laboratory; Ultra; Resolution; Electron

9601738 Scherer There is continuing effort to develop new techniques to reduce the lateral sizes of nanostructures. As the design of electron microscopes has improved, and the anisotropy of the pattern transfer processes is optimized, it is now becoming possible to fabricate structures below 10 nm. In this size regime fundamentally new types of device behavior are expected to occur. The exceptional sensitivity to size in this domain, in which structures are only tens of atoms across, means that even small improvements (e.g., factor of two) in the resolution and dimensional control of lithography and pattern transfer can have profound impact upon our ability to resolve new phenomena. In addition, the behavior of more conventional devices, such as semiconductor lasers, can be improved and controlled by high resolution lithography. Herein, the authors propose that low voltage electron beam lithography carried out by means of a field-emission electron microscope can provide such control. Funding is solicited to establish a laboratory of ultra high resolution electron beam (e-beam) nanofabrication and imaging. This laboratory will enable the development of new techniques for e-beam lithography at very low electron acceleration voltages, and will permit the fabrication of structures in the size regime approaching the molecular scale. It will serve to complement NSF's national laboratories for nanofabrication; its smaller size (a core group of two professors who have collaborated on nanostructures for a decade) is conducive to the pursuit of developmental work in electron beam lithography- sustained, rather specialized work that would be less facile in the larger user facilities. In addition, this collaboration brings together a unique combination of expertise and equipment that is essential for these endeavors. ***

9601738 Scherer 人们不断努力开发新技术来减小纳米结构的横向尺寸。 随着电子显微镜设计的改进以及图案转移工艺各向异性的优化，现在制造 10 nm 以下的结构已成为可能。 在这种尺寸范围内，预计会出现新型的设备行为。 在这个域中，结构只有数十个原子，对尺寸的异常敏感意味着，即使光刻和图案转移的分辨率和尺寸控制方面的微小改进（例如，两倍）也会对我们的能力产生深远的影响。解决新现象。 此外，更传统的器件（例如半导体激光器）的行为可以通过高分辨率光刻来改进和控制。 在此，作者提出通过场发射电子显微镜进行的低压电子束光刻可以提供这种控制。 寻求资金建立超高分辨率电子束（e-beam）纳米加工和成像实验室。 该实验室将能够在非常低的电子加速电压下开发电子束光刻新技术，并将允许制造尺寸接近分子尺度的结构。 它将补充 NSF 的纳米制造国家实验室；它的规模较小（由两位在纳米结构方面合作了十年的教授组成的核心小组）有利于追求电子束光刻的开发工作——持续的、相当专业的工作，而这些工作在较大的用户设施中不太容易进行。 此外，这种合作汇集了对这些努力至关重要的专业知识和设备的独特组合。 ***