Development of an Atomic Force Microscope for Use in Ultra-High Vacuum

开发用于超高真空的原子力显微镜

• 批准号: 9203133
• 负责人: William Unertl
• 金额: $ 6.1万
• 依托单位: University of Maine
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1992
• 资助国家: 美国
• 起止时间: 1992-08-01 至 1994-01-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9203133&HistoricalAwards=false
• 关键词: Development; Atomic; Force; Microscope; Use

The design and construction of an atomic force microscope (AFM) suitable for operation in an ultra-high vacuum environment (UHV) will be carried out in this project. The AFM will have interchangeable cantilever-tip assemblies, in situ sample exchange, and a field ion microscope (FIM) for tip characterization. The AFM will permit fundamental studies of adhesion, wear, and surface microstructure. In particular, nanometer scale studies of the following will be carried out: (a) mass transfer caused by contact between the tip and sample; (b) nanometer scale indentation of surface and thin film mechanical properties; (c) frictional forces between the tip and sample; (d) surface structure by imaging in contact and non-contact modes. %%% The AFM will be incorporated into an existing UHV surface analysis system equipped for Auger spectroscopy, ion sputtering, and in situ polymer and metal vapor deposition of thin films. Research will focus on the surface properties of non-conducting materials, specifically ceramics, polymers, and their composites. Thin films of metals and metal oxides on these materials will also be studied. The FIM will allow the study of tip damage and mass transfer during contact under well characterized conditions. The UHV AFM/FIM system will also be capable of scanning tunneling microscopy studies.

该项目将设计和建造适用于超高真空环境（UHV）的原子力显微镜（AFM）。 AFM 将具有可互换的悬臂尖端组件、原位样品交换和用于尖端表征的场离子显微镜 (FIM)。 AFM 将允许对粘附、磨损和表面微观结构进行基础研究。 特别是，将进行以下纳米尺度的研究：（a）尖端与样品之间接触引起的传质； (b) 表面和薄膜机械性能的纳米级压痕； (c) 尖端和样品之间的摩擦力； (d) 通过接触和非接触模式成像的表面结构。 %%% AFM 将被整合到现有的 UHV 表面分析系统中，该系统配备俄歇光谱、离子溅射以及薄膜的原位聚合物和金属气相沉积。 研究将集中在非导电材料的表面特性，特别是陶瓷、聚合物及其复合材料。 还将研究这些材料上的金属和金属氧化物薄膜。 FIM 将允许研究在良好表征的条件下接触期间的尖端损伤和质量传递。 UHV AFM/FIM 系统还能够进行扫描隧道显微镜研究。