Presidential Young Investigators Award: Sources and Applications for Short Wavelength Electromagnetic Radiation

总统青年研究员奖：短波长电磁辐射的来源和应用

• 批准号: 9057675
• 负责人: John Booske
• 金额: $ 32.25万
• 依托单位: University of Wisconsin-Madison
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1990
• 资助国家: 美国
• 起止时间: 1990-10-01 至 1997-03-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9057675&HistoricalAwards=false
• 关键词: Presidential; Young; Investigators; Award; Sources

Research is planned to make new advances in mm-and sub-mm wave sources, as well as their applications. This work will be based on prior experience in developing mm-wave Free Electron Laser devices at reduced beam voltages (both high power 0.5-1.0 MV FEL oscillators and 50 kV harmonic "ubitron" amplifiers). The new directions, however, will emphasize studies of compact, "low" voltage ( 100 kV), and moderate power (0.1-100 kW) devices to be compatible with commercially practical civilian and government applications. To accomplish new developments in this field, research innovations in electron beam generation and focusing techniques, small-scale radiation cavities and periodic structures, and nonlinear efficiency enhancement and mode control techniques will be carried out. Also research on compact periodic structures as an opportunity to research, develop, and perform (scaled) testing of new insertion devices for high energy electron storage rings will be performed. Such insertion devices should extend the capabilities of U.S. storage ring facilities as high brightness IR, VUV, and x-ray light source facilities for spectroscopic, materials science, lithographic, and biomedical applications. Finally, in addition to the ceramic sintering process, there are several new applications for moderate power mm-wave sources such as, mm-wave heating of a compact, high density, mirror plasma to efficiently generate soft x-rays for lithography and materials processing applications. Another interest is to study the use of mm-waves for improved thermal processing of dielectric coatings. A third area of interest would be the previously mentioned use of coherent sub-mm sources, (i.e., wavelengths between 0.01-1.0 mm) for spectroscopy of various chemical chain reactions and solid-state semi-conductor phenomena.

计划研究在毫米波和亚毫米波源及其应用方面取得新进展。 这项工作将基于先前在降低束电压下开发毫米波自由电子激光器件的经验（高功率 0.5-1.0 MV FEL 振荡器和 50 kV 谐波“ubitron”放大器）。 然而，新方向将强调紧凑型、“低”电压（100 kV）和中等功率（0.1-100 kW）设备的研究，以与商业实用的民用和政府应用兼容。 为实现该领域的新发展，将在电子束产生与聚焦技术、小尺寸辐射腔与周期结构、非线性效率增强与模式控制技术等方面开展研究创新。 还将对紧凑周期结构进行研究，作为研究、开发和执行（规模化）测试用于高能电子存储环的新型插入装置的机会。 此类插入装置应扩展美国存储环设施的功能，作为光谱、材料科学、光刻和生物医学应用的高亮度红外、真空紫外和 X 射线光源设施。 最后，除了陶瓷烧结工艺之外，中等功率毫米波源还有多种新应用，例如对紧凑、高密度、镜面等离子体进行毫米波加热，以有效生成用于光刻和材料加工的软 X 射线应用程序。 另一个兴趣是研究使用毫米波来改进介电涂层的热处理。 第三个感兴趣的领域是前面提到的使用相干亚毫米源（即波长在 0.01-1.0 毫米之间）进行各种化学链式反应和固态半导体现象的光谱分析。